12 月 27 日消息，DNP 大日本印刷当地时间本月 12 日宣布，成功在其光掩模制品上绘制了支持 2nm 及以下 EUV 工艺的精细光掩模图案；同时该企业还完成了支持 High NA EUV 光刻的光掩模的初步评估并已向生态合作伙伴出样。

Passengers wait for a high-speed electrical multiple unit (EMU) train on the platform of Karawang Station of Jakarta-Bandung High-Speed Railway in West Java, Indonesia, Dec. 24, 2024. Karawang Station ...

Multinational corporations have vowed to deepen cooperation with their Chinese partners and seize the huge opportunities presented by China's sharpened focus on bolstering technological innovation and ...